Highlights on photocathodes based on thin films prepared by pulsed laser deposition

We review the current status of metallic photocathodes based on thin films prepared by pulsed laser deposition (PLD) and we explore ways to improve the performance of these devices. PLD seems to be a very efficient and suitable technique for producing adherent and uniform thin films. Time-resolved mass spectrometric investigations definitively suggest that the deposition of high-purity metallic thin films should be carried out in ultrahigh vacuum systems and after a deep and careful laser cleaning of the target surface. Moreover, the laser cleaning of the target surface is highly recommended not only to remove the first contaminated layers but also to improve the quality of the vacuum by reducing the partial pressure of reactive chemical species as H2O, H2, and O2 molecules. The challenge to realize high-purity Mg and Y thin films is very interesting for the photocathode R&D due to the good photoemission properties of these metals.