Thin films of Er 3+-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O 2 pressure (5, 10 Pa) and at different substrate temperatures (RT, 100°C and 200°C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions.

Pulsed Laser Deposition of Er Doped Tellurite films on Large Area.

CARICATO, Anna Paola;LEGGIERI, Gilberto;MARTINO, Maurizio;
2007

Abstract

Thin films of Er 3+-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O 2 pressure (5, 10 Pa) and at different substrate temperatures (RT, 100°C and 200°C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11587/111805
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