Pulsed laser photodeposition from amorphous selenium aqueous colloid solutions using ArF laser radiation at a wavelength of lambda = 193 nm has been investigated. Nanometer thick layers were obtained on UV transparent silica substrates in contact with the solution for various photodeposition parameters. Amorphous Se layers, 20 mn thick, were obtained typically by 40 laser pulses of 30 ns duration with a fluence of 50 mJ/cm(2). Deposition thresholds for depositing 1 nm thick layers were as low as 5 pulses. The deposited nanometer thin surface morphology was analyzed by Evanescent Field Optical Microscopy, Scanning Electron Microscopy and Atomic Force Microscopy. The nanometer thicknesses were evaluated by utilizing the differential evanescent light pattern emanating from the substrates.
Pulsed laser photodeposition of a-Se nanofilms by ArF laser
CARICATO, Anna Paola;MARTINO, Maurizio;
2007-01-01
Abstract
Pulsed laser photodeposition from amorphous selenium aqueous colloid solutions using ArF laser radiation at a wavelength of lambda = 193 nm has been investigated. Nanometer thick layers were obtained on UV transparent silica substrates in contact with the solution for various photodeposition parameters. Amorphous Se layers, 20 mn thick, were obtained typically by 40 laser pulses of 30 ns duration with a fluence of 50 mJ/cm(2). Deposition thresholds for depositing 1 nm thick layers were as low as 5 pulses. The deposited nanometer thin surface morphology was analyzed by Evanescent Field Optical Microscopy, Scanning Electron Microscopy and Atomic Force Microscopy. The nanometer thicknesses were evaluated by utilizing the differential evanescent light pattern emanating from the substrates.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
