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EnglishUsing reactive pulsed laser deposition, a thin film of erbium-doped oxyfluoride-silicate glass is deposited onto a fused silica substrate. Rib waveguides are fabricated from this film using reactive ion etching. The fabrication and characterisation of these waveguides are summarised. As a result of various characterisation experiments described here, it is concluded that close to stoichiometric transfer of material from the bulk to the film has been achieved. It is concluded, however, that strong quenching mechanisms are present in the film, significantly affecting the magnitude of the I-4(13/2)->I-4(15/2) transition fluorescence lifetime
| Titolo: | Erbium doped waveguide fabrication via reactive pulsed laser deposition of multicomponent erbium doped oxyfluoride silicate glasses |
| Autori: | |
| Data di pubblicazione: | 2005 |
| Rivista: | |
| Abstract: | Using reactive pulsed laser deposition, a thin film of erbium-doped oxyfluoride-silicate glass is deposited onto a fused silica substrate. Rib waveguides are fabricated from this film using reactive ion etching. The fabrication and characterisation of these waveguides are summarised. As a result of various characterisation experiments described here, it is concluded that close to stoichiometric transfer of material from the bulk to the film has been achieved. It is concluded, however, that strong quenching mechanisms are present in the film, significantly affecting the magnitude of the I-4(13/2)->I-4(15/2) transition fluorescence lifetime |
| Handle: | http://hdl.handle.net/11587/108475 |
| Appare nelle tipologie: | Articolo pubblicato su Rivista |
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