Modern optical telecommunication requires materials having a broad emission band centered on 1.5 mu m to use as optical amplifier in WDM systems. Oxyfluoride glass demonstrate characteristics to satisfy this demand. Thin films of Er3+-doped oxyfluoride glass have been produced by Pulsed laser deposition technique using a KrF pulsed excimer laser and low-pressure (1-10 Pa) oxygen atmosphere. The optical transmission, the dispersion of refractive index and extinction coefficient, the guided optical modes and the film thickness have been investigated by different techniques. The best result was found at an oxygen pressure of 10 Pa, in which case the refractive index of the bulk and film were very close

Pulsed Laser Deposition of Er3+-doped Oxyfluoride Thin Films

MARTINO, Maurizio;CARICATO, Anna Paola;
2005

Abstract

Modern optical telecommunication requires materials having a broad emission band centered on 1.5 mu m to use as optical amplifier in WDM systems. Oxyfluoride glass demonstrate characteristics to satisfy this demand. Thin films of Er3+-doped oxyfluoride glass have been produced by Pulsed laser deposition technique using a KrF pulsed excimer laser and low-pressure (1-10 Pa) oxygen atmosphere. The optical transmission, the dispersion of refractive index and extinction coefficient, the guided optical modes and the film thickness have been investigated by different techniques. The best result was found at an oxygen pressure of 10 Pa, in which case the refractive index of the bulk and film were very close
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11587/108474
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