MAX phases are a group of ternary carbides or nitrides with a nanolayered microstructure. The general formula of MAX phases is Mn+1AXn with n = 1 to 3, where M is the transition metal, A is the A-group element (from IIIA to VIA), and X is either carbon or nitrogen. These carbides and nitride have an unusual behavior that combines the characteristics of metals and ceramics in terms chemical, physical, electrical and mechanical properties. These properties can be explained by the anisotropic lamellar microstructures of the MAX phases. Here, we report a study on thin Ti3InC2 (M3AX2) films, synthetized by repeated ion beam sputtering of single (Ti, In and C) elements at the Low Energy Ion Facility (LEIF). Ion beam sputtering was performed using an Ar+ ion beam with energy of 25 keV and a current of 400 μA. The thickness of the Ti3InC2 films (measured by RBS) was determined to be approximately 65 nm. After deposition, the samples were annealed in vacuum at 120 °C for 24 h to induce interphase chemical interactions and form the Ti3InC2 composite. To evaluate the radiation hardness and effects induced by ion radiation, the as-deposited Ti3InC2 film was irradiated by the 100 keV Ar+ ion beam with two different fluences, 1∙1013 cm−2 and 1∙1015 cm−2. It was determined that the low-level fluence of Ar+ ions (1∙1013 cm−2) did not induce any considerable change in surface roughness and that the polycrystalline structure was preserved. However, at higher fluences, the formation of concentrated point defects within the lattice of nanocrystalline Ti3InC2 and a low level of amorphization were registered. The mechanical properties determined by nanoindentation indicate the potential for using irradiated Ti3InC2 thin films under harsh environmental conditions.
Effect of Ar+ irradiation of Ti3InC2 at different ion beam fluences
Torrisi A.;
2020-01-01
Abstract
MAX phases are a group of ternary carbides or nitrides with a nanolayered microstructure. The general formula of MAX phases is Mn+1AXn with n = 1 to 3, where M is the transition metal, A is the A-group element (from IIIA to VIA), and X is either carbon or nitrogen. These carbides and nitride have an unusual behavior that combines the characteristics of metals and ceramics in terms chemical, physical, electrical and mechanical properties. These properties can be explained by the anisotropic lamellar microstructures of the MAX phases. Here, we report a study on thin Ti3InC2 (M3AX2) films, synthetized by repeated ion beam sputtering of single (Ti, In and C) elements at the Low Energy Ion Facility (LEIF). Ion beam sputtering was performed using an Ar+ ion beam with energy of 25 keV and a current of 400 μA. The thickness of the Ti3InC2 films (measured by RBS) was determined to be approximately 65 nm. After deposition, the samples were annealed in vacuum at 120 °C for 24 h to induce interphase chemical interactions and form the Ti3InC2 composite. To evaluate the radiation hardness and effects induced by ion radiation, the as-deposited Ti3InC2 film was irradiated by the 100 keV Ar+ ion beam with two different fluences, 1∙1013 cm−2 and 1∙1015 cm−2. It was determined that the low-level fluence of Ar+ ions (1∙1013 cm−2) did not induce any considerable change in surface roughness and that the polycrystalline structure was preserved. However, at higher fluences, the formation of concentrated point defects within the lattice of nanocrystalline Ti3InC2 and a low level of amorphization were registered. The mechanical properties determined by nanoindentation indicate the potential for using irradiated Ti3InC2 thin films under harsh environmental conditions.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
