We reports a study on pure and Ni-doped TiO2 thin films produced via laser ablation technique. The novelty of the work consists that both synthesis and doping were carried out in a single process, using a modified laser ion source to simultaneously make pulsed laser deposition (PLD) and low-energy ion implantation (by post-acceleration method). In particular, two titania films were synthesized via PLD starting from a rutile target. One of the two films was doped with Ni ions, accelerated with a voltage of 20 kV. The total implanted dose, evaluated by a Faraday cup, resulted to be 1 × 1014 ions/cm2. The crystalline phase of the obtained TiO2 films was analysed by Raman spectroscopy. A higher photocatalytic activity, measured under UV irradiation using methylene blue, was estimated for the Ni-doped titania film with respect the pure one.

Nickel doped TiO2 films by a modified laser plasma source for photocatalytic applications

Velardi L.;Scrimieri L.;Vasco G.;Serra A.;Manno D.;Nassisi V.;Calcagnile L.;Quarta G.
2020

Abstract

We reports a study on pure and Ni-doped TiO2 thin films produced via laser ablation technique. The novelty of the work consists that both synthesis and doping were carried out in a single process, using a modified laser ion source to simultaneously make pulsed laser deposition (PLD) and low-energy ion implantation (by post-acceleration method). In particular, two titania films were synthesized via PLD starting from a rutile target. One of the two films was doped with Ni ions, accelerated with a voltage of 20 kV. The total implanted dose, evaluated by a Faraday cup, resulted to be 1 × 1014 ions/cm2. The crystalline phase of the obtained TiO2 films was analysed by Raman spectroscopy. A higher photocatalytic activity, measured under UV irradiation using methylene blue, was estimated for the Ni-doped titania film with respect the pure one.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11587/441602
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