Laser ion sources offer the possibility to get ion beam useful to improve particle accelerators. Pulsed lasers at intensities of the order of 108 W/cm2 and of ns pulse duration, interacting with solid matter in vacuum, produce plasma of high temperature and density. The charge state distribution of the plasma generates high electric fields which accelerate ions along the normal to the target surface. The energy of emitted ions has a Maxwell–Boltzmann distribution which depends on the ion charge state. To increase the ion energy, a post-acceleration system can be employed by means of high voltage power supplies of about 100 kV. The post acceleration system results to be a good method to obtain high ion currents by a not expensive system and the final ion beams find interesting applications in the field of the ion implantation, scientific applications and industrial use. In this work we compare the electromagnetic and geometric properties, like emittance, of the beams delivered by pure Cu, Y and Ag targets. The characterization of the plasma was performed by a Faraday cup for the electromagnetic characteristics, whereas a pepper pot system was used for the geometric ones. At 60 kV accelerating voltage the three examined ion bunches get a current peak of 5.5, 7.3 and 15 mA, with a normalized beam emittance of 0.22, 0.12 and 0.09 mm mrad for the targets of Cu, Y, and Ag, respectively.

Electromagnetic and geometric characterization of accelerated ion beams by laser ablation

NASSISI, Vincenzo;VELARDI, LUCIANO;DELLE SIDE, DOMENICO
2013-01-01

Abstract

Laser ion sources offer the possibility to get ion beam useful to improve particle accelerators. Pulsed lasers at intensities of the order of 108 W/cm2 and of ns pulse duration, interacting with solid matter in vacuum, produce plasma of high temperature and density. The charge state distribution of the plasma generates high electric fields which accelerate ions along the normal to the target surface. The energy of emitted ions has a Maxwell–Boltzmann distribution which depends on the ion charge state. To increase the ion energy, a post-acceleration system can be employed by means of high voltage power supplies of about 100 kV. The post acceleration system results to be a good method to obtain high ion currents by a not expensive system and the final ion beams find interesting applications in the field of the ion implantation, scientific applications and industrial use. In this work we compare the electromagnetic and geometric properties, like emittance, of the beams delivered by pure Cu, Y and Ag targets. The characterization of the plasma was performed by a Faraday cup for the electromagnetic characteristics, whereas a pepper pot system was used for the geometric ones. At 60 kV accelerating voltage the three examined ion bunches get a current peak of 5.5, 7.3 and 15 mA, with a normalized beam emittance of 0.22, 0.12 and 0.09 mm mrad for the targets of Cu, Y, and Ag, respectively.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11587/372298
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