High intensity ion beams can be reached by laser plasma or applying high electric fields or utilizing large acceleration gaps. We get it developing a double acceleration gap system supplied by two power generators of different bias voltages. In this way we realized a new LIS accelerator configuration in order to produce and to accelerate ions of different elements. The LIS consisted of a laser-induced plasma from solid targets, where the plume freely expands before the action of the accelerating fields. Our system provides ion beams of maximum energy up to 160 keV per charge state.

Low Emittance Plasma Ions Beam by a new Double Accelerating Configuration

NASSISI, Vincenzo;LORUSSO, ANTONELLA;SICILIANO, MARIA VITTORIA;
2010-01-01

Abstract

High intensity ion beams can be reached by laser plasma or applying high electric fields or utilizing large acceleration gaps. We get it developing a double acceleration gap system supplied by two power generators of different bias voltages. In this way we realized a new LIS accelerator configuration in order to produce and to accelerate ions of different elements. The LIS consisted of a laser-induced plasma from solid targets, where the plume freely expands before the action of the accelerating fields. Our system provides ion beams of maximum energy up to 160 keV per charge state.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11587/339221
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