C-nitroso compds. and their complexes with transition metals have never been used before in Langmuir expts. Some π-A isotherms were registered for several C-nitroso derivs. For 2 metal complexes (Pd(II) and Rh(I)), thin films were deposited by the std. vertical dipping method. UV-visible spectroscopy was performed to analyze the absorption bands of the deposited films. Measurements of the dependence of the elec. cond. were carried out between 300 and 450 K. All samples display an activated elec. cond. at high temp. and related activation energies were detd. A decrease of the activation energy is reported for the Pd complex thin films into a flux of air and ppm NO2. Platinate(1-), trichloro(2-methyl-2-nitrosopropane-N)-, potassium, (SP-4-2)- 68851-40-1.

C-nitroso compounds as novel promising substances for the deposition of LB films

RELLA, Roberto;SERRA, Antonio;VASAPOLLO, Giuseppe;VALLI, Ludovico
1996-01-01

Abstract

C-nitroso compds. and their complexes with transition metals have never been used before in Langmuir expts. Some π-A isotherms were registered for several C-nitroso derivs. For 2 metal complexes (Pd(II) and Rh(I)), thin films were deposited by the std. vertical dipping method. UV-visible spectroscopy was performed to analyze the absorption bands of the deposited films. Measurements of the dependence of the elec. cond. were carried out between 300 and 450 K. All samples display an activated elec. cond. at high temp. and related activation energies were detd. A decrease of the activation energy is reported for the Pd complex thin films into a flux of air and ppm NO2. Platinate(1-), trichloro(2-methyl-2-nitrosopropane-N)-, potassium, (SP-4-2)- 68851-40-1.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11587/327422
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