Room-temperature nanoimprint lithography in air is used in order to pattern a nonthermoplastic, low-molar-mass thiophene-based pentamer with excellent gain properties. No degradation of the luminescence efficiency of the active medium was observed after patterning. In this way, we fabricated single-mode emission distributed feedback lasers having a threshold excitation fluence of 140 mJ/cm2. The lasing line is peaked at 637 nm and exhibits a linewidth of less than 0.7 nm and a well-behaved input-output characteristic in the whole range of pump fluences. These results demonstrate room-temperature nanoimprint lithography as powerful and straightforward fabrication technique for oligomer-based nanostructured optoelectronic devices.
Oligomer-based organic distributed feedback lasers by room-temperature nanoimprint lithography
PISIGNANO, Dario;VISCONTI, Paolo;CINGOLANI, Roberto;GIGLI, Giuseppe;
2003-01-01
Abstract
Room-temperature nanoimprint lithography in air is used in order to pattern a nonthermoplastic, low-molar-mass thiophene-based pentamer with excellent gain properties. No degradation of the luminescence efficiency of the active medium was observed after patterning. In this way, we fabricated single-mode emission distributed feedback lasers having a threshold excitation fluence of 140 mJ/cm2. The lasing line is peaked at 637 nm and exhibits a linewidth of less than 0.7 nm and a well-behaved input-output characteristic in the whole range of pump fluences. These results demonstrate room-temperature nanoimprint lithography as powerful and straightforward fabrication technique for oligomer-based nanostructured optoelectronic devices.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
