A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on several different light-emitting low-molar-mass organic semiconductors, without any degradation of the active materials after patterning (see Figure). This could be the only process that permits the transfer of a height profile to films of this very important class of low-molar-mass conjugated molecules with poor thermoplastic behavior.

Room-Temperature Nanoimprint Lithography of non-Thermoplastic Organic Films

PISIGNANO, Dario;VISCONTI, Paolo;
2004

Abstract

A grating resolution of up to 200 nm is achieved using room-temperature nanoimprint lithography on several different light-emitting low-molar-mass organic semiconductors, without any degradation of the active materials after patterning (see Figure). This could be the only process that permits the transfer of a height profile to films of this very important class of low-molar-mass conjugated molecules with poor thermoplastic behavior.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11587/107367
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