We report a flexible method for the patterning of organic semiconductors in the submicrometer range, which we have successfully applied to thin films of poly~p-phenylene vinylene! ~PPV! prepared on a variety of substrates, such as quartz, indium–tin oxide coated glass, or inorganic dielectric mirrors. The method is based on holographic lithography performed by a corner cube interferometer of our own design and construction, followed by Ar-ion etching.

Holographic nanopatterning of the organic semiconductor poly (p-phenylene vinylene) PPV

RINALDI, Rosaria;VISCONTI, Paolo;
1998

Abstract

We report a flexible method for the patterning of organic semiconductors in the submicrometer range, which we have successfully applied to thin films of poly~p-phenylene vinylene! ~PPV! prepared on a variety of substrates, such as quartz, indium–tin oxide coated glass, or inorganic dielectric mirrors. The method is based on holographic lithography performed by a corner cube interferometer of our own design and construction, followed by Ar-ion etching.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11587/107328
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