Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 × 1016 cm−2 and 1016 cm−2, respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.
Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study
MANNO, Daniela Erminia;
2004-01-01
Abstract
Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 × 1016 cm−2 and 1016 cm−2, respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.File in questo prodotto:
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